Gate CD control for full chip using total-process-proximity-based correction method
- 著者名:
Nam,B.H. ( Hyundai Electronics Industries Co.,Ltd. ) Park,J.O. Lee,D.J. Cheong,J.H. Hwang,Y.J. Song,Y.J. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4066
- 発行年:
- 2000
- 開始ページ:
- 716
- 終了ページ:
- 724
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- 言語:
- 英語
- 請求記号:
- P63600/4066
- 資料種別:
- 国際会議録
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Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
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