CrOxFy as a material for attenuated phase-shift masks in ArF lithography

CrOxFy as a material for attenuated phase-shift masks in ArF lithography

著者名:

Nakazawa,K. ( Semiconductor Leading Edge Technologies,Inc. )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4066

発行年:

2000

開始ページ:

682

終了ページ:

687

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819437020 [0819437026]

言語:

英語

請求記号:

P63600/4066

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017594
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2000 : 7th
会議開催地:	Yokohama, Japan
会議開催年:	2000.04.12-2000.04.13

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