Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-ヲフm reticle fabrication
- 著者名:
Arai,T. ( Hitachi,Ltd. ) Sakamizu,T. Kasuya,K. Katoh,K. Soga,T. Saitoh,H. Shiraishi,H. Hoga,M. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4066
- 発行年:
- 2000
- 開始ページ:
- 281
- 終了ページ:
- 288
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- 言語:
- 英語
- 請求記号:
- P63600/4066
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
6
国際会議録
Effective OPC pattern generation using chemically amplified resist 0.13-ヲフm design rule masks
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |