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Lithography performance of contact holes:I.Optimization of Pattern fidelity using MPG and MPG-II

著者名:
Weaver,S. ( Etec Systems Inc. )
Lu,M.
Chabala,J.M.
Ton,D.
Sauer,C.A.
MAck,C.A.
さらに 1 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology VII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4066
発行年:
2000
開始ページ:
160
終了ページ:
171
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819437020 [0819437026]
言語:
英語
請求記号:
P63600/4066
資料種別:
国際会議録

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