EUV mask absorber characterization and selection

EUV mask absorber characterization and selection

著者名:

Yan,P. ( Intel Corp. )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4066

発行年:

2000

開始ページ:

116

終了ページ:

123

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819437020 [0819437026]

言語:

英語

請求記号:

P63600/4066

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017594
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2000 : 7th
会議開催地:	Yokohama, Japan
会議開催年:	2000.04.12-2000.04.13

類似資料:

1 国際会議録 EUV mask patterning approaches Yan,P., Zhang,G., Kofron,P., Chow,J., Stivers,A.R., Tejnil,E., Cardinale,G.F., Kearney,P.A. SPIE - The International Society for Optical Engineering	7 国際会議録 Mask technology for EUV lithography Bujak,M., Burkhart,S.C., Cerjan,C.J., Kearney,P.A., Moore,C.E., Prisbrey,S., Sweeney,D.W., Tong,W.M., Vernon,S.P., … SPIE - The International Society for Optical Engineering
2 国際会議録 EUV mask fabrication with Cr absorber Mangnat,P.J., Hector,S.D., Rose,S., Cardinale,G.F., Tenjil,E., Stivers,A.R. SPIE - The International Society for Optical Engineering	8 国際会議録 Pattern inspection of EUV masks using DUV light Liang, T., Tejnil, E., Stivers, A.R. SPIE-The International Society for Optical Engineering
3 国際会議録 EUV mask process development and integration [6283-91] Zhang, G., Yan, -Y. P., Liang, T., Du, Y., Sanchez, P., Park, S., Lanzendorf, J. E., Choi, J. C., Shu, Y. E., Stivers, … SPIE - The International Society of Optical Engineering	9 国際会議録 EUV mask pattern defect printability [6283-95] Liang, T., Zhang, G., Naulleau, P., Myers, A., Park, -J. S., Stivers, A., Vandentop, G. SPIE - The International Society of Optical Engineering
4 国際会議録 EUV mask absorber defect repair with focused ion beam Yan,P., Yan,S., Zhang,G., Kearney,P.A., Richards,J., Kofron,P., Chow,J. SPIE - The International Society for Optical Engineering	10 国際会議録 EUV substrate and blank inspection with confocal microscopy Urbach, J.-P., Cavelaars, J.F.W., Kusunose, H., Liang, T., Stivers, A.R. SPIE - The International Society of Optical Engineering
5 国際会議録 EUV mask absorber defect size requirement at 100-nm design rules Yan,P., Zhang,G., Chow,J., Kofron,P., Langston,J.C., Solak,H., Kearney,P.A., Cardinale,G.F., Berger,K.W., Henderson,C.C. SPIE-The International Society for Optical Engineering	11 国際会議録 Enhanced optical inspectability of patterned EUVL mask Liang,T., Stivers,A., Yan,P.-Y., Tejnil,E., Zhang,G. SPIE-The International Society for Optical Engineering
6 国際会議録 EUV mask pilot line at Intel Corporation (Keynote Address) Stivers, A. R., Yan, P. -Y., Zhang, G., Shu, E. Y., Tejnil, E., Lieberman, B., Nagpal, R., Hsia, K., Penn, M., Lo, F. … SPIE - The International Society of Optical Engineering	12 国際会議録 Progress on EUV mask fabrication for 32-nm technology node and beyond G. Zhang, P. -Y. Yan, T. Liang, S. Park, P. Sanchez, E. Y. Shu, E. A. Ultanir, S. Henrichs, A. Stivers, G. Vandentop, B. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12