Resolution enhancement techniques and mask manufacturability for subwavelength lithography
- 著者名:
- Karklin,K. ( Numerical Technologies,Inc. )
- Lin,B.J.
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4066
- 発行年:
- 2000
- 開始ページ:
- 40
- 終了ページ:
- 46
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819437020 [0819437026]
- 言語:
- 英語
- 請求記号:
- P63600/4066
- 資料種別:
- 国際会議録
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4
国際会議録
Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
SPIE-The International Society for Optical Engineering |
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