Chemical Amplification for the Design of Sensitive Electron-Beam and X-ray Resist Systems
- 著者名:
- Ito, Hiroshi
- 掲載資料名:
- Radiation effects on polymers
- シリーズ名:
- ACS symposium series
- シリーズ巻号:
- 475
- 発行年:
- 1991
- 開始ページ:
- 326
- 出版情報:
- Washington, D.C.: American Chemical Society
- ISSN:
- 00976156
- ISBN:
- 9780841221659 [0841221650]
- 言語:
- 英語
- 請求記号:
- A05800/475
- 資料種別:
- 国際会議録
類似資料:
American Chemical Society |
SPIE-The International Society for Optical Engineering |
American Chemical Society |
SPIE - The International Society of Optical Engineering |
American Chemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Profile characteristics and simulation of chemically amplified resists in electron-beam lithography
SPIE-The International Society for Optical Engineering |