Chemistry and Manufacturing Requirements of X-ray Resists

Chemistry and Manufacturing Requirements of X-ray Resists

著者名:

掲載資料名:

Radiation effects on polymers

シリーズ名:

ACS symposium series

シリーズ巻号:

475

発行年:

1991

開始ページ:

310

出版情報:

Washington, D.C.: American Chemical Society

ISSN:

00976156

ISBN:

9780841221659 [0841221650]

言語:

英語

請求記号:

A05800/475

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017562
シリーズID:	PA00000004
会議名:	National Meeting of the American Chemical Society
回次:	200th
会議開催地:	Washington, DC, USA
会議開催年:	1990.08.26-1990.08.31

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2 国際会議録 High Aspect Ratio Optical Resist Chemistry for MEMS Applications LaBianca, N.C., Gelorme, J.D., Lee, K.Y., Cooper, E., O'Sullivan, E.J.M., Shaw, J. Electrochemical Society	8 国際会議録 Comparison of measured sidewall roughness for positive-tone chemically amplified resists exposed by x-ray lithography Reynolds, G. W., Taylor, J. W. SPIE - The International Society of Optical Engineering
3 国際会議録 Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion Dentinger,P.M., Taylor,J.W. SPIE-The International Society for Optical Engineering	9 国際会議録 Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists [6349-05] Sullivan, D., Okawa, Y., Sugawara, K., Benes, Z., Kotani, J. SPIE - The International Society of Optical Engineering
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5 国際会議録 Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique Lu,B., Dentinger,P.M., Taylor,J.W., Feke,G.D., Hessman,D., Wu,Q., Grober,R.D. SPIE - The International Society for Optical Engineering	11 国際会議録 UVN2-negative chemically amplified resist optimization for x-ray mask fabrication Rocque,J.M., Lercel,M.J., Brooks,C.J., Henry,R.W., Benoit,D.E. SPIE - The International Society for Optical Engineering
6 国際会議録 Manufacturability of the ultrathin resist process Pike,C., Bell,S., Plat,M.V., King,P., Nguyen,K.B., Lyons,C.F., Levinson,H.J., Phan,K.A., Okoroanyanwu,U. SPIE - The International Society for Optical Engineering	12 国際会議録 Multiple-nonvolatile acetal (MANA) resists Guevremont,J.M., Brainard,R.L., Reeves,S.D., Zhou,X., Nguyen,T.B., Mackevich,J.F., Anderson,E.H., Taylor,G.N. SPIE-The International Society for Optical Engineering

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