SPECTROSCOPIC ELLIPSOMETRY CHARACTERISATION OF THIN FILM POLYSILICON
- 著者名:
- 掲載資料名:
- Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 324
- 発行年:
- 1994
- 開始ページ:
- 39
- 出版情報:
- Pittsburgh: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992238 [1558992235]
- 言語:
- 英語
- 請求記号:
- M23500/324
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Characterisation of the Oxidation Kinetics of Thin, Low Temperature, Electroless Plated Copper Films
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
2
国際会議録
REFLECTANCE ANISOTROPY AND SPECTROSCOPIC ELLIPSOMETRY CHARACTERISATION OF WET SILICON WAFER CLEANING
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Electrochemical Society |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |