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Reliability of Cu/WN Thin Films Deposited on Low-Dielectric Constant SiOF ILD

著者名:
Lee, Seoghyeong
Kim, Dong Joon
Yang, Sung-Hoon
Park, Jeongwon
Sohn, Seil
Oh, Kyunghui
Kim, Yong-Tae
Park, Jong-Wan
さらに 3 件
掲載資料名:
Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
511
発行年:
1998
開始ページ:
347
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994171 [1558994173]
言語:
英語
請求記号:
M23500/511
資料種別:
国際会議録

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