High-Density Plasma Etching of Low-Dielectric Constant Materials

High-Density Plasma Etching of Low-Dielectric Constant Materials

著者名:

Standaert, T. E. F. M.

掲載資料名:

Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

511

発行年:

1998

開始ページ:

265

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994171 [1558994173]

言語:

英語

請求記号:

M23500/511

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017529
シリーズID:	PA00000011
会議名:	Symposium on low-dielectric constant materials
回次:	4th
会議開催地:	San Francisco, CA, USA
会議開催年:	1998.04.14-1998.04.16

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