Overview of Process Integration Issues for Low-K Dielectrics
- 著者名:
Havemann, R. H. Jain, M. K. List, R. S. Ralston, A. R. Shih, W-Y. Jin, C. Chang, M. C. Zielinski, E. M. Dixit, G. A. Singh, A. Russell, S. W. Gaynor, J. F. McKerrow, A. J. Lee, W. W. - 掲載資料名:
- Low-dielectric constant materials IV : symposium held April 14-16, 1998, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 511
- 発行年:
- 1998
- 開始ページ:
- 3
- 出版情報:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994171 [1558994173]
- 言語:
- 英語
- 請求記号:
- M23500/511
- 資料種別:
- 国際会議録
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10
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PROCESS INTEGRATION AND MANUFACTURABILITY ISSUES FOR HIGH PERFORMANCE MULTILEVEL INTERCONNECT
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