Rapid Thermal Epitaxy for Device Applications
- 著者名:
King, C. A. Johnson, R. W. Chiu, T. Y. Sung, J. M. Mastrapasqua, M. Pinto, M. R. - 掲載資料名:
- Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 387
- 発行年:
- 1995
- 開始ページ:
- 311
- 出版情報:
- Pittsburgh, PA: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992900 [1558992901]
- 言語:
- 英語
- 請求記号:
- M23500/387
- 資料種別:
- 国際会議録
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4
国際会議録
Selective and Non-Selective Rapid Thermal Epitaxy of Si/Si1-xGe, Heterojunction Bipolar Transistors
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