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Characterization of Rapid Nitrided Ultrathin SiO2 Films by XPS and SCS

著者名:
掲載資料名:
Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
387
発行年:
1995
開始ページ:
247
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992900 [1558992901]
言語:
英語
請求記号:
M23500/387
資料種別:
国際会議録

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