Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 ヲフm
- 著者名:
Ku,T.-K. ( National Chiao Tung Univ. ) Hsieh,B.B. Chen,M.S. Wang,C.-C. Wang,P.W. Hsieh,I.-J. Cheng,H.-C. - 掲載資料名:
- Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2641
- 発行年:
- 1995
- 開始ページ:
- 140
- 終了ページ:
- 144
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420077 [0819420077]
- 言語:
- 英語
- 請求記号:
- P63600/2641
- 資料種別:
- 国際会議録
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10
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Optimization of i-line resist process for 0.5-ヲフm polysilicon gate structures using a top-coat layer
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