Fast EB-PEC system for 0.25-ヲフm device reticle fabrication using a variable shaped beam machine
- 著者名:
- Tomita,M. ( Sony Corp. )
- Ohnuma,H.
- Koyama,M.
- Kawahira,H.
- 掲載資料名:
- 15th Annual BACUS Symposium on Photomask Technology and Management
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2621
- 発行年:
- 1995
- 開始ページ:
- 546
- 終了ページ:
- 557
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819419859 [0819419850]
- 言語:
- 英語
- 請求記号:
- P63600/2621
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |