Thermal stability of PECVD W-B-N thin film as a diffusion barrier
- 著者名:
- Kim,Y.T. ( Korea Institute of Science and Technology )
- Kim,D.J. ( Korea Institute of Science and Technology and Hanyang Univ.(Korea) )
- Lee,C.W. ( Kookmin Univ.(Korea) )
- Park,J.-W. ( Hanyang Univ.(Korea) )
- 掲載資料名:
- Multilevel Interconnect Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3214
- 発行年:
- 1997
- 開始ページ:
- 48
- 終了ページ:
- 56
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819425461 [081942546X]
- 言語:
- 英語
- 請求記号:
- P63600/3214
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
2
国際会議録
Improvement in diffusion barrier properties of PECVD W-N thin film by low-energy BF2+ implantation
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MRS-Materials Research Society |
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Electrochemical Society |
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