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Stress effect on the via crack of IMD structure in scrubber processing

著者名:
Huang,D.F. ( Taiwan Semiconductor Manufacturing Co. )
Yeh,R.S.
Lin,T.-Y.
Hung,C.-C.
Lin,T.C.
Chang,C.H.
Chen,C.H.
さらに 2 件
掲載資料名:
Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3892
発行年:
1999
開始ページ:
377
終了ページ:
384
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434937 [0819434930]
言語:
英語
請求記号:
P63600/3892
資料種別:
国際会議録

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