Ultralow-stress silicon-rich nitride films for microstructure fabrication

Ultralow-stress silicon-rich nitride films for microstructure fabrication

著者名:

Cheng,M.-C. ( National Tsing Hua Univ. )
Ho,W.-G.
Chang,C.-P.
Huang,W.-S.
Huang,R.-S.

掲載資料名:

Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3892

発行年:

1999

開始ページ:

152

終了ページ:

157

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819434937 [0819434930]

言語:

英語

請求記号:

P63600/3892

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017166
シリーズID:	PA00000029
会議名:	Smart Materials, Nano-, and Micro- Smart Systems : Device and process technologies for MEMS and microelectronics
回次:	1999
会議開催地:	Royal Pines Resort, Queensland, Australia
会議開催年:	1999.10.27-1999.10.29

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