Characterization of sub-0.18-ヲフm critical dimension pattern collapse for yield improvement
- 著者名:
Zhong,T.X. ( Silicon Valley Group,Inc ) Gurer,E. Lee,E. Bai,H. Gendron,B. Krishna,M.S. Reynolds,R.M. - 掲載資料名:
- Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3882
- 発行年:
- 1999
- 開始ページ:
- 158
- 終了ページ:
- 168
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819434791 [0819434795]
- 言語:
- 英語
- 請求記号:
- P63600/3882
- 資料種別:
- 国際会議録
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