High Deposition Rate Amorphous Silicon Solar Cells and Thin Film Transistors using the Pulsed Plasma PECVD Technique
- 著者名:
- Madan,Arun
- 掲載資料名:
- Proceedings of the Tenth International Workshop on the Physics of Semiconductor Devices (December 14-18, 1999)
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3975
- 発行年:
- 2000
- 巻:
- Part2
- 開始ページ:
- 1191
- 終了ページ:
- 1197
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436016 [0819436011]
- 言語:
- 英語
- 請求記号:
- P63600/3975
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
American Institute of Chemical Engineers |
Materials Research Society |
American Institute of Chemical Engineers |
Materials Research Society |
Materials Research Society |
5
国際会議録
OXYGENATED AND FLOURINATED AMORPHOUS SILICON NITRIDE FILMS AND THEIR USE IN THIN FILM TRANSISTORS
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
SPIE - The International Society of Optical Engineering |