Investigation of inhomogeneous in-plane strain relaxation in Si/SiGe quantum wires by high resolution X-ray diffraction
- 著者名:
Zhuang, Y. Schelling, C. Roch, T. Daniel, A. Schaffler, F. Bauer, G. Grenzer, J. Pietsch, U. Senz, S. - 掲載資料名:
- Applications of synchrotron radiation techniques to materials science V : sympoisum held November 29-December 3, 1999, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 590
- 発行年:
- 2000
- 開始ページ:
- 207
- 出版情報:
- Warrendale, Pa.: MRS-Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994980 [155899498X]
- 言語:
- 英語
- 請求記号:
- M23500/590
- 資料種別:
- 国際会議録
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