Blank Cover Image

Selective Si/SiGe Heterostructures for Advanced CMOS and BiCMOS Technologies

著者名:
Regolini, J. L.  
掲載資料名:
Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
470
発行年:
1997
開始ページ:
99
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993747 [1558993746]
言語:
英語
請求記号:
M23500/470
資料種別:
国際会議録

類似資料:

1 国際会議録 Advanced ESD Protection Solutions in CMOS/BiCMOS Technologies

J. J. Liou, J. A. Salcedo, Z. Liu

Electrochemical Society
7 国際会議録 SiGe Selective Epitaxy: Morphology and Thickness Control for High Performance CMOS Technology

J.R. Holt, E.C. Harley, T.N. Adam, S. Jeng, K. Tabakman

Electrochemical Society
2 国際会議録 Operation of SiGe BICMOS Technology at Cryogenic Temperatures

Bradford, G.D., Cressler, J.D., Harame, D.L.

Electrochemical Society
8 国際会議録 SELECTIVE EPITAXIAL SILICON AND SELECTIVE TITANIUM SILICIDE IN AN INDUSTRIAL INTEGRATED CLUSTER TOOL

Regolini, J. L., Margail, J., Morin, C., Gouy-Pailler, P.

MRS - Materials Research Society
3 国際会議録 Noise Behaviour in SiGe BiCMOS Technology

Regis, M, Plana, R., Borgarino, M, Tartarin, J.G., Llopis, O., Lafontaine, H., Kovacic, S.

ESA Publications Division
9 国際会議録 INVITED: A NEW JUNCTION TECHNOLOGY BASED ON SELECTIVE CVD OF SiGe ALLOYS FOR CMOS TECHNOLOGY NODES BEYOND 30 nm

Oztiirk, M.C., Pesovic, N., Liu, J., Mo, H., Kang, I., Gannavaram, S.

Electrochemical Society
4 国際会議録 A high-frequency divider in 0.18 um SiGe BiCMOS technology

N. Kamal, Y. Zhu, L. T. Hall, S. F. Al-Sarawi, C. Burnet, I. Holland, A. Khan, A. Pollok, J. Poyner, M. Boers, J. A. …

SPIE - The International Society of Optical Engineering
10 国際会議録 INVITED: A NEW JUNCTION TECHNOLOGY BASED ON SELECTIVE CVD OF SiGe ALLOYS FOR CMOS TECHNOLOGY NODES BEYOND 30 nm

Oztiirk, M.C., Pesovic, N., Liu, J., Mo, H., Kang, I., Gannavaram, S.

Electrochemical Society
5 国際会議録 Applications Focused Trends in SiGe BiCMOS Technologies (Invited paper)

St Onge, S., Joseph, A., Lanzerotti, L., Feiichenfeld, N., Coolbaugh, D., Orner, B., Dunn, J., Harame, D.

Electrochemical Society
11 国際会議録 DESIGN AND INTEGRATION OF ROBUST BSD PROTECTION IN CMOS/BICMOS TECHNOLOGIES

LlOU, JUIN J.

Electrochemical Society
6 国際会議録 Selective Titanium Silicide for Industrial Applications

Maury, D., Regolini, J. L., Gayet, P.

MRS - Materials Research Society
12 国際会議録 Trends in SiGe BiCMOS Process Integration

Harame, D., Subbanna, S., Dunn, J., St Onge, S.A., Freeman, G., Malinowski, J., Groves, R., Joseph, A., Ahlgren, D., …

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12