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Effects of Size and Shape of Lateral Confinement on the Formation of NiSi2, CoSi2 and TiSi2 on Silicon Inside Miniature Size Oxide Openings

著者名:
Chen, L. J.
Yew, J. Y.
Cheng, S. L.
Chen, K. M.
Nakamura, K.
Tsui, B. Y.
さらに 1 件
掲載資料名:
Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
427
発行年:
1996
開始ページ:
499
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993303 [1558993304]
言語:
英語
請求記号:
M23500/427
資料種別:
国際会議録

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