Chemical Vapor Deposition of Al Films from Dimethylethylamine Alane on GaAs(100)2｡ﾟ4 Surfaces

Chemical Vapor Deposition of Al Films from Dimethylethylamine Alane on GaAs(100)2｡ﾟ4 Surfaces

著者名:

掲載資料名:

Advanced metallization for future ULSI : symposium held April 8-11, 1996, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

427

発行年:

1996

開始ページ:

277

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993303 [1558993304]

言語:

英語

請求記号:

M23500/427

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017054
シリーズID:	PA00000011
会議名:	Symposium on advanced metallization for future ulsi
回次:	1996
会議開催地:	San Francisco, CA, USA
会議開催年:	1996.04.08-1996.04.11

類似資料:

1 国際会議録 Amorphous Mixed TiO2 And SiO2 Films On Si(100) By Chemical Vapor Deposition Smith, Ryan C., Taylor, Charles J., Roberts, Jeffrey, Hoilien, Noel, Campbell, Stephen A., Gladfelter, Wayne L. Materials Research Society	7 国際会議録 Low-Temperature Chemical Vapor Deposition of Titanium Dioxide Thin Films Using Tetranitratotitanium (IV) Gilmer, D. C., Gladfelter, W. L., Colombo, D. G., Taylor, C. J., Roberts, J., Campbell, S. A., Kim, H-S., Wilk, G. D., … MRS - Materials Research Society
2 国際会議録 FT-IR Diagnostics of Gas Phase Reactions and Effect of Carrier Gases in the Metal- Organic Chemical Vapor Deposition of Aluminum from Dimethylethylamine Alane Yun, J.-Y., Park, M.-Y., Rhee, S.-W. Electrochemical Society	8 国際会議録 Metalorganic Chemical Vapor Deposition (MOCVD) of Aluminum from Dimethylethvlamine Alane (DMEAA) Kim, B.-Y., Rhee, S.-W. Electrochemical Society
3 国際会議録 Deposition Sequences for Atomic Layer Growth of AIN Thin Films on Si(100) Using Dimethylethylamine Alane and Ammonia Kuo, Jason S., Rogers, J. W., Jr. MRS - Materials Research Society	9 国際会議録 Combinatorial Chemical Vapor Deposition of Metal Silicate Films Using Tri(t-butoxy) silanol and Anhydrous Metal Nitrates Zhong, Lijuan, Chen, Fang, Campbell, Stephen A., Gladfelter, Wayne L. Materials Research Society
4 国際会議録 Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO2, and SnO2 Gladfelter, W., Xia, B., Chen, F., Campbell, S., Roberts, J. Electrochemical Society	10 国際会議録 Pre-Treatment Effect on Aluminum Thin Films Deposition From CVD Using Dimethylethylamine Alane Jang, Tae Woong, Rhee, Hwa Sung, Ahn, Byung Tae MRS - Materials Research Society
5 国際会議録 ALUMINUM PARTICLE FORMATION IN THE GAS PHASE OF A LOW PRESSURE CHEMICAL VAPOR DEPOSITION REACTOR USING DIMETHYLETHYLAMINE ALANE (AlH3) AS A PRECURSOR Simmonds, Michael G., Gladfelter, Wayne L., Li, Haojiang, McMurry, Peter H. Materials Research Society	11 国際会議録 METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF ALUMINUM FROM TRIALKYLAMINE ALANES Gross, M.E., Dubois, L.H., Nuzzo, R.G., Cheung, K.P. Materials Research Society
6 国際会議録 Chemical Vapor Deposition of Titania/Silica and Zirconia Films Gladfelter, Wayne L., Smith, Ryan C., Burleson, David, Taylor, Charles J., Roberts, Jeffrey T., Campbell, Stephen A., … Materials Research Society	12 国際会議録 Dependence of Composition and Microstructure of RuOx Films on Target Status and Substrate Temperature in Reactive Sputtering Deposition Wang, Q., Yang, K. -A., Franciosi, A., Evans, D. F., Gladfelter, W. L. MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12