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Characterization of Defects Created in Silicon Due to Etching in Low-Pressure Plasmas Containing Fluorine and Oxygen

著者名:
Buyanova, I. A.
Henry, A.
Monemar, B.
Lindstrom, J. L.
Lamprecht, A.
Svensson, B. G.
Oehrlein, G. S.
さらに 2 件
掲載資料名:
Ion-solid interactions for materials modification and processing : symposium held November 27-December 1, 1995, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
396
発行年:
1996
開始ページ:
599
出版情報:
Pittsburgh: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992993 [1558992995]
言語:
英語
請求記号:
M23500/396
資料種別:
国際会議録

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