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Comparative Study of Experimental Techniques for Boron Profiling at Poly-Si/SiO2 Interface

著者名:
Furtsch, M.
Bevk, J.
Bude, J.
Downey, S. W.
Krisch, K. S.
Moriya, N.
Silverman, P. J.
Luftman, H. S.
さらに 3 件
掲載資料名:
Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
378
発行年:
1995
開始ページ:
857
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992818 [1558992812]
言語:
英語
請求記号:
M23500/378
資料種別:
国際会議録

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