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TUNABILITY OF INTRINSIC STRESS IN SiOx DIELECTRIC FILMS FORMED BY MOLECULAR BEAM DEPOSITION

著者名:
掲載資料名:
Thin films, stresses and mechanical properties V : symposium held November 28-December 2, 1994, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
356
発行年:
1995
開始ページ:
195
出版情報:
Pittsburgh, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992573 [155899257X]
言語:
英語
請求記号:
M23500/356
資料種別:
国際会議録

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