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COMPARISON OF MULTIPOLAR RESONANT-CAVITY AND MAGNETIC MIRROR MICROWAVE ECR SOURCES FOR DRY ETCHING OF III-V SEMICONDUCTORS

著者名:
掲載資料名:
Microwave processing of materials IV : symposium held April 4-8, 1994, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
347
発行年:
1994
開始ページ:
441
出版情報:
Pittsburgh,, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558992474 [1558992472]
言語:
英語
請求記号:
M23500/347
資料種別:
国際会議録

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