Processing applications with the 157-nm fluorine excimer laser

Processing applications with the 157-nm fluorine excimer laser

著者名:

Herman,P.R. ( Univ.of Toronto )

掲載資料名:

Excimer lasers, optics, and applications : 12-13 February 1997, San Jose, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2992

発行年:

1997

開始ページ:

86

終了ページ:

95

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424037 [081942403X]

言語:

英語

請求記号:

P63600/2992

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00017039
シリーズID:	PA00000029
会議名:	Photonics West : Excimer Lasers, Optics,and Application
回次:	1997
会議開催地:	San Jose, CA, USA
会議開催年:	1997.02.12-1997.02.13

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2 国際会議録 157-nm laser-induced modification of fused-silica glasses Zhang,J., Herman,P.R., Lauer,C., Chen,K.P., Wei,M. SPIE-The International Society for Optical Engineering	8 国際会議録 Advances in resists for 157-nm microlithography Trinque, B.C., Osborn, B.P., Chambers, C.R., Hsieh, Y.-T., Corry, S.B., Chiba, T., Hung, R.J., Tran, H.V., Zimmerman, … SPIE-The International Society for Optical Engineering
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