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Low-temperature process for very high aspect ratio silicon microstructures using SOG etch mask

著者名:
掲載資料名:
Microlithography and Metrology in Micromachining
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2640
発行年:
1995
開始ページ:
178
終了ページ:
183
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819420060 [0819420069]
言語:
英語
請求記号:
P63600/2640
資料種別:
国際会議録

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