Electron-Positron-Channeling and Mossbauer-Effect Studies of Indium-Vacancy Complexes in Ion-Implanted Nickel

Electron-Positron-Channeling and Mossbauer-Effect Studies of Indium-Vacancy Complexes in Ion-Implanted Nickel

著者名:

Besold,B.

掲載資料名:

Vacancies and interstitials in metals and alloys : Proceedings of the International Conference on Vacancies and Interstitials in Metals and Alloys held in Berlin, Germany, September 14-19, 1986

シリーズ名:

Materials science forum

シリーズ巻号:

15-18

発行年:

1987

巻:

Pt.2

開始ページ:

665

終了ページ:

668

出版情報:

Aederlmannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878495528 [0878495525]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016959
シリーズID:	PA00000012
会議名:	International Conference on Vacancies and Interstitials in Metals and Alloys
回次:	1986
会議開催地:	Berlin, Germany
会議開催年:	1986.09.14-1986.09.19

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