Molecular and ionic contamination monitoring for clean-room air and wafer surfaces

Molecular and ionic contamination monitoring for clean-room air and wafer surfaces

著者名:

Sun,P. ( MEMC Electronic Materials,Inc. )
Adams,M. ( MEMC Electronic Materials,Inc. )
Shive,L. ( MEMC Electronic Materials,Inc. )
Pirooz,S. ( MEMC Electronic Materials,Inc. )

掲載資料名:

In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3215

発行年:

1997

開始ページ:

118

終了ページ:

127

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426475 [0819426474]

言語:

英語

請求記号:

P63600/3215

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016931
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing
回次:	1997
会議開催地:	Austin, TX, USA
会議開催年:	1997.10.01-1997.10.02

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