Doping Behaviour of In0.53Ga0.47As and InP Grown by Metalorganic Vapour Phase Epitaxy
- 著者名:
- 掲載資料名:
- Physics of - Semiconductor Devices -
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3316
- 発行年:
- 1998
- 巻:
- Part 1
- 開始ページ:
- 289
- 終了ページ:
- 292
- 出版情報:
- New Delhi: Narosa Publishing House
- ISSN:
- 0277786X
- ISBN:
- 9780819427564 [081942756X]
- 言語:
- 英語
- 請求記号:
- P63600/3316
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Materials Research Society |
2
国際会議録
PRECIPITATION PHENOMENA ASSOCIATED WITH ULTRA-HIGH Be DOPING IN Ga0.47In0.53 P LAYERS GROWN BY MBE
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Materials Research Society |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |