Blank Cover Image

Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics Applications

著者名:
掲載資料名:
Plasma processing of semiconductors
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
336
発行年:
1997
開始ページ:
433
終了ページ:
475
総ページ数:
43
出版情報:
Dordrecht: kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792345671 [0792345673]
言語:
英語
請求記号:
N11482/336
資料種別:
国際会議録

類似資料:

1 国際会議録 Low-temperature PECVD optical waveguide and device development in Australia

Love,J.D., Ladouceur,F.J., Durandet,A., Boswell,R.W., Charles,C.

SPIE-The International Society for Optical Engineering
7 テクニカルペーパー Helicon Double Layer Thrusters

C. Charles, R. Boswell, P. Alexander, C. Costa, O. Sutherland, L. Pfitzner, R. Franzen, J. Kingwell, A. Parfitt, P. …

American Institute of Aeronautics and Astronautics
2 国際会議録 Object-oriented numerical modeling for integrated optics

Ladouceur,F.J., Poladian,L.

SPIE-The International Society for Optical Engineering
8 国際会議録 Inductively-Coupled Plasma Deposition of Low Temperature Silicon Dioxide and Silicon Nitride Films for III-V Applications

Mackenzie, K.D., Lee, J.W, Johnson, D.J.

Electrochemical Society
3 国際会議録 Characterization of Low-Temperature PECVD Silicon Dioxide Films

Deenapanray, P. N. K., Lengyel, J., Tan, H. H., Petravic, M., Durandet, A., Williams, J. S., Jagadish, C.

MRS - Materials Research Society
9 国際会議録 Increasing the imaging capabilities of the VLTI using integrated optics

Kern, P.Y., Malbet, F., Berger, J.-P., Haguenauer, P., Schanen, I., Labeye, P., Rousselet- Perraut, K., Arezki, B., …

SPIE-The International Society for Optical Engineering
4 国際会議録 Mechanical properties of PECVD silicon oxide films suitable for integrated optics applications

Rodrfguez,J.A., Dominguez,C., Munoz,F.J., Llobera,A.

SPIE - The International Society for Optical Engineering
10 国際会議録 SiOF Film Deposition Using FTES Gas In Helicon Wave Plasmas

Yun, S.-M., Chang, H.-Y., Lee, K.-M., Kim, D.-C., Choe, C.-K.

Electrochemical Society
5 国際会議録 Wavelength shifts in UV-exposed single-mode fused taper fiber couplers

Ashby,S.J., Charters,R.B., Love,J.D., Ladouceur,F.J., Elias,M.C.

SPIE-The International Society for Optical Engineering
11 国際会議録 Characterization Of Silicon Dioxide Films Deposited In A Vertical Diffusion Furnace For Medium Temperature Applications

Watt, V.H.C., Nakatani, D., Moinpour, M., Hwang, D., Lu, W.

Electrochemical Society
6 国際会議録 Planar add/drop two-wavelength filter employing a blazed Bragg grating and a 3 x 3 asymmetric coupler

Gaff,K.W., Ladouceur,F.J., Love,J.D.

SPIE - The International Society for Optical Engineering
12 国際会議録 Development of low temperature silicon nitride and silicon dioxide films by inductively-coupled plasma chemical vapor deposition

Lee, J.W., Mackenzie, K.D., Johnson, D., Pearton, S.J., Ren, F., Sasserath, J.N.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12