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PHYSICAL VAPOR DEPOSITION OF MULTICOMPONENT OXIDE THIN FILMS: TECHNIQUES, BASIC DEPOSITION PROCESSES AND FILM PROCESSING-MICROSTRUCTURE-PROPERTY RELATIONSHIPS

著者名:
掲載資料名:
Multicomponent and multilayered thin films for advanced microtechnologies : techniques, fundamentals, and devices
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
234
発行年:
1993
開始ページ:
151
終了ページ:
208
総ページ数:
58
出版情報:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792322658 [0792322657]
言語:
英語
請求記号:
N11482/234
資料種別:
国際会議録

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