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Improvement of ultrathin gate oxide by a novel rapid thermal oxidation process with in-situ steam generation

著者名:
Yu,M.C. ( Taiwan Semiconductor Manufacturing Co. )
Jang,S.M.
Diaz,C.H.
Yu,C.H.
Sun,S.C.
Liang,M.S.
さらに 1 件
掲載資料名:
Microelectronic Device Technology III
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3881
発行年:
1999
開始ページ:
234
終了ページ:
241
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819434784 [0819434787]
言語:
英語
請求記号:
P63600/3881
資料種別:
国際会議録

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