EPITAXIAL CoSi2 FILM FORMATION ON (100) Si BY ANNEALING OF Co/Ti/Si STRUCTURE IN N2
- 著者名:
- 掲載資料名:
- Common themes and mechanisms of epitaxial growth : symposium held April 13-15, 1993, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 312
- 発行年:
- 1993
- 開始ページ:
- 193
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992085 [1558992081]
- 言語:
- 英語
- 請求記号:
- M23500/312
- 資料種別:
- 国際会議録
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ELECTRICAL CHARACTERISATION OF EPITAXIAL (100) CoSi2/Si CONTACTS OBTAINED USING A Ti/Co BILAYER
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