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Real-Time Spectroscopic Ellipsometry Study of the Thermal Cleaning Process for Silicon Epitaxial Growth by UHV-CVD

著者名:
Nozawa, K.
Katayama, K.
Kanzawa, Y.
Sugahara, G.
Saitoh, T.
Kubo, M.
さらに 1 件
掲載資料名:
In situ process diagnostics and modelling : symposium held April 6-7, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
569
発行年:
1999
開始ページ:
83
出版情報:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994768 [1558994769]
言語:
英語
請求記号:
M23500/569
資料種別:
国際会議録

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