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Lattice Sites and Damage Annealing of Implanted Tm and Er in Si

著者名:
Wahl, U.
Correia, J. G.
Wachter, J. De
Langouche, G.
Marques, J. G.
Moons, R.
Vantomme, A.
the ISOLDE Collaboration
さらに 3 件
掲載資料名:
Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
469
発行年:
1997
開始ページ:
407
出版情報:
Pittsburg, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558993730 [1558993738]
言語:
英語
請求記号:
M23500/469
資料種別:
国際会議録

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