Point Defects, Diffusion, and Gettering in Silicon

Point Defects, Diffusion, and Gettering in Silicon

著者名:

Gosele, U.

掲載資料名:

Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

469

発行年:

1997

開始ページ:

13

出版情報:

Pittsburg, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993730 [1558993738]

言語:

英語

請求記号:

M23500/469

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016586
シリーズID:	PA00000011
会議名:	Symposium on defects and diffusion in silicon processing
回次:	1997
会議開催地:	San Francisco, CA, USA
会議開催年:	1997.04.01-1997.04.04

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2 国際会議録 THE INFLUENCE OF POINT DEFECTS ON DIFFUSION AND GETTERING IN SILICON Goselle, U., Tan, T. Y. Materials Research Society	8 国際会議録 Intrinsic Point Defects and Diffusion Processes in Silicon Tan, T. Y. North-Holland
3 国際会議録 LOW TEMPERTURE WAFER DIRECT BONDING Q.-Y. Tong, G. Cha, R. Gafiteanu, U. Gosele Electrochemical Society	9 国際会議録 Gold Diffusion in Silicon During Gettering by an Aluminum Layer Joshi, Subhash M., Gosele, Ulrich M., Tan, Teh Y. MRS - Materials Research Society
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6 国際会議録 INVITED: SCIENCE AND MODELING OF IMPURITY GETTERING IN SILICON Tan, T.Y., Gafiteanu, R., Joshi, S.M., Goesele, U.M. Electrochemical Society	12 国際会議録 Minority Carrier Diffusion Length Improvement in Czochralski Silicon by Aluminum Gettering Joshi, Subhash M., Gosele, Ulrich M., Tan, Teh Y. MRS - Materials Research Society

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