Low-Temperature Low-Stress Silicon Nitride for Optoelectronic Applications Prepared by Electron-Cyclotron Resonance Plasma Chemical Vapor Deposition

Low-Temperature Low-Stress Silicon Nitride for Optoelectronic Applications Prepared by Electron-Cyclotron Resonance Plasma Chemical Vapor Deposition

著者名:

掲載資料名:

Amorphous and crystalline insulating thin films--1996 : symposium held December 2-4, 1996, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

446

発行年:

1997

開始ページ:

151

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558993501 [1558993509]

言語:

英語

請求記号:

M23500/446

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016584
シリーズID:	PA00000011
会議名:	Symposium on amorphous and crystalline insulating thin films
回次:	1996
会議開催地:	Boston, MA, USA
会議開催年:	1996.12.02-1996.12.04

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