Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography

Optical proximity effects correction at 0.25ｦﾌm incorporating process variations in lithography

著者名:

Tritchkov,A. ( Interuniv.Micro-Elektronica Centrum vzw )

掲載資料名:

Optical Microlithography X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3051

発行年:

1997

開始ページ:

726

終了ページ:

738

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424655 [081942465X]

言語:

英語

請求記号:

P63600/3051

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016573
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1997 : 10th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1997.03.12-1997.03.14

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