Aberration effects in the region of 0.18-ｦﾌm lithography with KrF excimer stepper

Aberration effects in the region of 0.18-ｦﾌm lithography with KrF excimer stepper

著者名:

Yim,D. ( Hyundai Electronics Industries Co.,Ltd. )
Lim,C.-M.
Kim,H.-S.
Baik,K.-H.

掲載資料名:

Optical Microlithography X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3051

発行年:

1997

開始ページ:

714

終了ページ:

723

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424655 [081942465X]

言語:

英語

請求記号:

P63600/3051

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016573
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1997 : 10th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1997.03.12-1997.03.14

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