0.25-ヲフm multilevel interconnect with DUV processing
- 著者名:
- Krisa,W.L. ( Texas Instruments Inc. )
- Shaw,S.Y.
- Brennan,K.
- Dixit,G.A.
- Jain,M.K.
- 掲載資料名:
- Optical Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3051
- 発行年:
- 1997
- 開始ページ:
- 352
- 終了ページ:
- 361
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- 言語:
- 英語
- 請求記号:
- P63600/3051
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
7
国際会議録
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
10
国際会議録
Optical proximity effects correction at 0.25ヲフm incorporating process variations in lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |