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NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels

著者名:
Beeck,M.Op de ( Interuniv.Micro-Elektronica Centrum vzw )
Ronse,K.
Ghandehari,K.
Jaenen,P.
Botermans,H.
Finders,J.
Lilygren,J.A.
Baker,D.C.
Vandenberghe,G.
Bisschop,P.De
Maenhoudt,M.
hove,L.Van den
さらに 7 件
掲載資料名:
Optical Microlithography X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3051
発行年:
1997
開始ページ:
320
終了ページ:
332
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
言語:
英語
請求記号:
P63600/3051
資料種別:
国際会議録

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