Mask defect printability at 0.18-ヲフm design rules for 193-nm lithography
- 著者名:
- Yan,P. ( Intel Corp. )
- Tran,A.
- Schmidt,M.R.
- 掲載資料名:
- Optical Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3051
- 発行年:
- 1997
- 開始ページ:
- 308
- 終了ページ:
- 318
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- 言語:
- 英語
- 請求記号:
- P63600/3051
- 資料種別:
- 国際会議録
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10
国際会議録
Top-surface imaging and optical proximity correction:a way to 0.18-ヲフm lithography at 248 nm
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