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Line-width variation with different sublayers for 0.25-ｦﾌm minimum feature size in DUV lithography

著者名:
Oh,H.-K. ( Hanyang Univ. )
Cho,S.-Y.
Jeong,Y.-U.
Kang,H.-Y.
Lee,G.-S.
An,I.
Park,I.-H.
さらに 2 件
掲載資料名:
Optical Microlithography X
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3051
発行年:
1997
開始ページ:
215
終了ページ:
224
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424655 [081942465X]
言語:
英語
請求記号:
P63600/3051
資料種別:
国際会議録

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