Durability of experimental fused silicas to 193-nm induced compaction

Durability of experimental fused silicas to 193-nm induced compaction

著者名:

Schenker,R.E. ( Univ.of California/Berkeley )
Piao,F.
Oldham,W.G.

掲載資料名:

Optical Microlithography X

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3051

発行年:

1997

開始ページ:

44

終了ページ:

53

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819424655 [081942465X]

言語:

英語

請求記号:

P63600/3051

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016573
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	1997 : 10th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1997.03.12-1997.03.14

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2 国際会議録 Material limitations to 193-nm lithographic system lifetimes Schenker,R.E., Piao,F., Oldham,W.G. SPIE-The International Society for Optical Engineering	8 国際会議録 Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens … Algots, J.M., Sandstrom, R., Partlo, W., Takahashi, K., Ishii, H., Hasegawa, Y. SPIE - The International Society of Optical Engineering
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