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The growth of Si1-yCy/Si and Si1-x-yGexCy/Si heterostructures by ion implantation and pulsed excimer laser-induced epitaxy

著者名:
Fogarassy,E. ( S.de Unamuno,Lab.PHASE/CNRS )
Grob,A.
Grob,J.-J.
Muller,D.
Prevot,B.
Stuck,R.
Boher,P.
Stehle,M.X.
さらに 3 件
掲載資料名:
Laser Applications in Microelectronic and Optoelectronic Manufacturing II
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2991
発行年:
1997
開始ページ:
202
終了ページ:
210
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819424020 [0819424021]
言語:
英語
請求記号:
P63600/2991
資料種別:
国際会議録

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